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NXT GmbH
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Offline thin film spectrometer for OLED Xelas 1e7d77a1-a213-43c4-b0b1-e9ab837e8122.webp
Thin Film Measurement Spectroscopy
Offline thin film spectrometer for OLED Xelas
Owning the proprietary RT-Method spectroscopic technology, the Xelas LAB/SCAN-oled measurement system allows for the determination of thickness (2–500nm) and optical constants (n&k) completely non-contact. This is the ideal measurement solution to help control quality and R&D of thin films in OLED components, organic materials, and ITO electrodes.
Thin film spectrometer for solar cells Helios SCAN-tn 2.webp
Wafer Inspection & Metrology
Thin film spectrometer for solar cells Helios SCAN-tn
The application of advanced spectroscopic technology, the Helios SCAN-tn coating measurement system provides the ability to analyze the thickness and refractive index of Silicon Nitride thin films at a speed of <0.5s/point. This is a non-contact measurement solution specifically designed for solar cell wafers, helping to optimize the quality control process of anti-reflective (AR) coatings comprehensively.
Gap monitoring camera for Cz furnace ETA-SiCAM siapp.webp
Synthesis & Fabrication
Gap monitoring camera for Cz furnace ETA-SiCAM

The ETA-SiCAM gap distance measurement device features a patented optical design, providing accuracy <0.5mm and a measurement speed of 5Hz. This is the optimal solution for maintaining stable thermodynamic control in Czochralski crystal pullers (Cz), enhancing the quality of Silicon ingots for solar cells and semiconductor components.

Multi-purpose spectroscopic camera TCM uScope 1.webp
Thin Film Measurement Spectroscopy
Multi-purpose spectroscopic camera TCM uScope
As an advanced micro-spectroscopy measurement system, the TCM µScope (NXT) integrates a specialized microscopic measurement head with an extremely small measurement spot size down to 5µm. The device accurately analyzes thin film thickness (2nm - 25µm), optical constants, and color. This is the optimal measurement solution for the semiconductor industry, flat panel display (FPD) manufacturing, and material coating.
Thin film spectrometer for Lithium batteries TCM R-NIR lit-lab.webp
Thin Film Measurement Spectroscopy
Thin film spectrometer for Lithium batteries TCM R-NIR
With advanced non-contact spectral technology, NXT's TCM thin film thickness measurement system provides ultra-fast measurement speeds of ≤ 2ms with an accuracy resolution of ± 0.1 µm. This is the most cost-effective and reliable solution for monitoring the quality (QC) of dielectric films in Lithium battery production, helping to detect inline deviations early, optimize materials, and completely eliminate the risk of battery short circuits.
Offline multi-purpose reflectance and thickness spectrometer ETA-SST image2.webp
Thin Film Measurement Spectroscopy
Offline multi-purpose reflectance and thickness spectrometer ETA-SST
The ETA-SST reflectance spectrometer system from NXT utilizes linear array sensor technology, measuring the range of 380-1700 nm. The device achieves optical resolution of up to 3.3 nm, enabling accurate measurement of single/double layer thickness (0.1–30 µm). With a compact design, this is an optimized productivity solution for R&D and QA/QC of semiconductor components, optical glass, and packaging.
Offline multi-purpose transmittance and color spectrometer ETA-CSS image2.webp
Thin Film Measurement Spectroscopy
Offline multi-purpose transmittance and color spectrometer ETA-CSS
The ETA-CSS laboratory optical transmission and color measurement system from NXT uses advanced spectral technology, providing chromaticity xyY accuracy of ±0.002. This is an optimal cost-effective solution for controlling the quality of thin films, filters, and optical glass, supporting enhanced production efficiency through a simple operating process.
Thin film spectrometer for ophthalmic lenses ETA-ARC image4.webp
Thin Film Measurement Spectroscopy
Thin film spectrometer for ophthalmic lenses ETA-ARC
With proprietary back reflection cancellation technology, NXT's ETA-ARC lens coating measurement system is the optimal solution for quality inspection of eyewear. The device quickly measures excess reflection, color, and thickness of hard coatings (0.1–20 µm) in less than 0.2 seconds without the need for roughening or black coating the back, helping to preserve the integrity of the sample being measured.
Inline multi-purpose spectrometer ETA-TCM image3.webp
Thin Film Measurement Spectroscopy
Inline multi-purpose spectrometer ETA-TCM

The inline spectrometer system ETA-TCM from NXT provides a 100% non-destructive thin film quality control solution directly on the production line. The device supports simultaneous measurement of thickness (0.1–30 µm), color, transmittance, reflectance, and optical density (OD1–OD7). This is the optimal solution to save materials and enhance productivity for the screen, glass, and semiconductor industries.

Thin film spectrometer for large format glass Metis
Thin Film Measurement Spectroscopy
Thin film spectrometer for large format glass Metis
The integrated smart integrating sphere, the Metis optical thin film measurement system from NXT provides superior thin film quality control capabilities thanks to a wide measurement spectrum range of 380–1070nm and an extremely fast speed of <0.1 seconds/point. This is the optimal cost-effective solution for measuring reflectance, transmittance, film thickness, and n&k constants on roll-to-roll films and large glass.
Inline thin film spectrometer for OLED Xelas f38ec04f-f297-447d-a2ab-7bbd7a8f4e70.webp New!
Thin Film Measurement Spectroscopy
Inline thin film spectrometer for OLED Xelas
It is an advanced inline OLED film thickness measurement system, the Xelas INLINE-oled, which integrates NXT's proprietary RT optical method to accurately control thickness (2-500nm) and n&k in real-time. With a non-contact measurement design, this optimal solution helps OLED display and lighting manufacturers increase productivity and yield.
Thin film spectrometer for solar cells Helios-r8 image4.webp
Wafer Inspection & Metrology
Thin film spectrometer for solar cells Helios-r8
As an advanced Poly-Si coating measurement system, Helios-r8 provides ultra-fast measurement speeds of ≤ 200ms with a thickness accuracy of ±1nm. Based on non-contact optical reflection technology, the device helps control quality and optimize the coating process on TOPCon solar wafer panels, perfectly meeting the requirements for both Inline and Offline analysis.
Thin film spectrometer for solar cells Helios-rc image4.webp
Wafer Inspection & Metrology
Thin film spectrometer for solar cells Helios-rc
Integrating integral field technology and high-resolution spectrometers, the Helios-rc reflectometer accurately analyzes reflectance, color, and coating thickness at a speed of <100ms. The device is an ideal cost-effective solution for controlling the texturing and etching processes of solar cell wafer surfaces (PERC, TOPCon), optimizing photovoltaic performance.
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