Main features
- Two high-power SLMs, layout fine-tuned for optimal throughput and image quality
- Two writing modes: QX (quality) – 325 mm²/min, FX (fast) – 580 mm²/min
- CD uniformity of 30 mm, SLM intensity adjustment automatically with an accuracy of 2%
- Overlay of 30 nm thanks to a differential interferometer of 1.2 nm, Zerodur table, temperature stable ±0.02 K
- Second layer alignment achieving 100 nm – critical for phase shift masks (PSM)
- Custom-designed lens, NA 0.9, address grid 4 nm, optimized for wavelengths 355 nm and 640 nm
- DPSS 355 nm laser, lifespan of 20,000 hours, costs 80% less than gas lasers
Detailed description
Technology & principle
ULTRA uses two spatial light modulators (SLM) operating in parallel, directly illuminating the mask from digital data. High-speed data transmission processes complex geometries. The machine table uses linear motors and air bearings. The autofocus system through the main lens.
Limitations of traditional lithography
- Gas lasers (Kr+, Ar+) consume a lot of power, high replacement costs.
- Difficult to achieve accurate overlay and alignment for PSM masks due to substrate deformation.
- CD is uneven with a high density structure.
Advantages of the ULTRA maskless lithography system
- Two SLMs in parallel + high-speed transmission → significantly reduced exposure time.
- DPSS 355 nm laser saves 80% costs, lifespan of 20,000 hours.
- Zerodur table + interferometer 1.2 nm + temperature-controlled cabinet ±0.02K → 30 nm overlay.
- Matrix distortion correction algorithm → second layer alignment 100 nm.
- NA 0.9 lens, pure diffraction limit → 30 mm uniform CD.
Integration & expansion
Compatible with all i‑line optical barriers (355 nm), integrated flowbox. Zerodur chuck with 3-point support, high repeatability. Easy installation into mask production workshop.