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  3. Synthesis & Fabrication - 24 items
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[63716-141012-141017-3617151] Ion Beam Etching/Sputtering System Elionix 200ERP New!
Synthesis & Fabrication
Ion Beam Etching/Sputtering System Elionix 200ERP
[1752828286504] Plasma Enhanced Chemical Vapour Deposition Model PlasmaPro 80/100/800
Chemical Vapor Deposition (CVD)
Plasma Enhanced Chemical Vapour Deposition Model PlasmaPro 80/100/800
[1752571374544] Electron Beam Lithography System ELS-ORCA img6576b88ede4dc.jpg
Synthesis & Fabrication
Electron Beam Lithography System ELS-ORCA
[1752567035152] ELS-BODEN Electron beam lithography system img6310549954213.png New!
Synthesis & Fabrication
ELS-BODEN Electron beam lithography system
Thin Film Deposition System NANO 36 Detail - NANO 36 png.webp
Physical Vapor Deposition (PVD)
Thin Film Deposition System NANO 36
Thin Film Deposition System AXXIS Photo-SY-E-Beam-Open.webp
Physical Vapor Deposition (PVD)
Thin Film Deposition System AXXIS
Thin Film Deposition System PRO Line PVD 200 Photo-PVD200-Load Lock-Web.webp
Physical Vapor Deposition (PVD)
Thin Film Deposition System PRO Line PVD 200
Thin Film Deposition System PRO Line PVD 75 Photo-SY-PVD75-OpenFrameLL-Web.webp
Physical Vapor Deposition (PVD)
Thin Film Deposition System PRO Line PVD 75
Tabletop Maskless Aligner µMLA - Heidelberg Instruments µMLA_Dual_Comparment_Micro_Container.webp New!
Maskless and Direct-Write Lithography
Tabletop Maskless Aligner µMLA - Heidelberg Instruments
DWL 2000 GS / DWL 4000 - Laser Lithography System dwl-2000-4000_grayscale-lithography.webp
Maskless and Direct-Write Lithography
DWL 2000 GS / DWL 4000 - Laser Lithography System
Glovebox Jacomex G(Safe) GSafe-1-1-1.webp
Fundamental Research Equipment
Glovebox Jacomex G(Safe)
DWL 66+ Maskless Laser Lithography DWL66_Rings_700nmPitch_xxmW_27_Application-Image.webp
Maskless and Direct-Write Lithography
DWL 66+ Maskless Laser Lithography
MLA 300 Maskless Aligner - Heidelberg Instruments MLA300_Exposures_04.webp
Maskless and Direct-Write Lithography
MLA 300 Maskless Aligner - Heidelberg Instruments
ULTRA Semiconductor Mask Writer - Heidelberg Instruments ULTRA-Zerodur-Chuck.webp
Maskless and Direct-Write Lithography
ULTRA Semiconductor Mask Writer - Heidelberg Instruments
UHV Thin Film Deposition System LAB Line Photo-SY-LABLine-Web.webp
Physical Vapor Deposition (PVD)
UHV Thin Film Deposition System LAB Line
VPG 300 DI Maskless Stepper - Heidelberg Instruments AppImg_VPG300DI_VPG400_CMOS-personalization_2-bw.webp
Maskless and Direct-Write Lithography
VPG 300 DI Maskless Stepper - Heidelberg Instruments
Gap monitoring camera for Cz furnace ETA-SiCAM siapp.webp
Synthesis & Fabrication
Gap monitoring camera for Cz furnace ETA-SiCAM
Physical Vapor Deposition Batch In-Line KDF Photo-SY-KDF-844i.webp
Physical Vapor Deposition (PVD)
Physical Vapor Deposition Batch In-Line KDF
NanoFrazor Nanolithography Tool pillars-SEM-image-reversal-process-NanoFrazor.webp
Maskless and Direct-Write Lithography
NanoFrazor Nanolithography Tool
MLA 150 Maskless Aligner - Heidelberg Instruments MLA150_450nm_Lines-and-Spaces.webp
Maskless and Direct-Write Lithography
MLA 150 Maskless Aligner - Heidelberg Instruments
Atomic Layer Deposition System ALD-150LX ALD150LX-Component-LX-Assembly.webp
Atomic Layer Deposition (ALD)
Atomic Layer Deposition System ALD-150LX
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