Skip to Content
Filters
Shop
5 items found.
Clear Filters
Semiconductor Technology
Secondary Ion Mass Spectrometry (SIMS)
SIMS 7f-Auto Secondary Ion Mass Spectrometer

Equipped with dual magnetic convergence SIMS technology, the IMS 7f-Auto secondary ion mass spectrometer provides excellent depth resolution with a detection limit of ppb. This is a fully automated analytical solution that delivers high throughput for the semiconductor, optoelectronics, and materials industries, maximizing productivity with continuous operation 24/7.

Secondary Ion Mass Spectrometry (SIMS)
Secondary Ion Mass Spectrometry (SIMS) - ACTINIS

Developed from the renowned IMS 7f platform, the secondary ion mass spectrometry (SIMS) with ACTINIS casing features an advanced radiation protection system, allowing for the measurement of radioactive samples up to 2 Gy/h. The device achieves sub-micron spatial resolution, optimizing transmission and the ability to measure isotope ratios. This is a safe automation solution, ideal for optimizing the nuclear fuel cycle and waste management.

3D X-ray Microscopy (XRM)
TriLambda-30 X-ray Microscope

TriLambdaXRM-30 (nanoXRM) utilizes Sigray's proprietary X-ray optics technology to provide cutting-edge resolution of 35nm. The device integrates up to 3 X-ray energy sources simultaneously to optimize the 3D nanoXRM image contrast for all types of materials from polymers to metals, providing a perfect non-destructive sample solution for batteries and biology.

Electron Microscopy (SEM & TEM)
Scanning electron microscope - Focused Ion Beam DB550
FIB-SEM|DB550 integrated with electron optical technology SuperTunnel breakthrough with Gallium ion beam (Ga⁺ liquid metal ion source), providing a resolution of 3nm and sharp images. The device helps optimize the analysis and sample preparation process TEM specimen preparation, perfectly applicable for the semiconductor (semiconductor) field and materials science.
Electron Microscopy (SEM & TEM)
High Speed Scanning Electron Microscope HEM6000

CIQTEK HEM6000 integrates technologies such as a high-brightness electron gun with a large beam current, a high-speed electron beam deflection system, and a high voltage sample deceleration mechanism. The device accelerates the speed of large-scale nano structure imaging up to 5 times faster than conventional FESEM, providing a perfect large-scale 3D reconstruction solution for the semiconductor and biological industries (biological 3D reconstruction).

Showing 5 of 5 results