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Materials Sciences
Chemical Vapor Deposition (CVD)
Plasma Enhanced Chemical Vapour Deposition Model PlasmaPro 80/100/800

The PlasmaPro series from Oxford Instruments provides flexible plasma processing platforms from R&D to high-volume production, including RIE, ICP, ICP CVD, PECVD, and combined RIE/PE technologies. It supports wafers from small pieces to 300mm, controls film stress with dual frequency (LF/HF), and detects endpoint using OES/laser. An optimal solution for MEMS, sensors, optics, LEDs, power microelectronics, and failure analysis.

Physical Vapor Deposition (PVD)
Thin Film Deposition System NANO 36
NANO 36 is a highly optimized basic thin film deposition device from Kurt J. Lesker. This device is designed to provide a cost-effective solution while ensuring superior component quality, high performance, and a compact installation area.
High-Resolution Ultra-Trace Analysis
X-ray Photoelectron Spectrometry (XPS) SPECS ProvenX

Danh mục sản phẩm của SPECS đã được mở rộng với dòng hệ thống quang phổ XPS ProvenX, đại diện cho đỉnh cao từ nền tảng kiến thức rộng lớn của chúng tôi trong việc phát triển và sản xuất các hệ thống phân tích toàn diện nhằm đáp ứng những yêu cầu khoa học khắt khe nhất. ProvenX bao gồm một loạt các hệ thống XPS chuyên dụng cho ARPES, µ-ARPES, Kính hiển vi động lượng (Momentum Microscopy), XPS/UPS cũng như NAP-XPS.

Physical Vapor Deposition (PVD)
Thin Film Deposition System AXXIS
AXXIS is a versatile PVD thin film deposition system designed for research and development (R&D) activities that require various coating techniques on the same equipment. The system allows for the combination of Magnetron sputtering, thermal evaporation, and electron beam evaporation while supporting co-deposition to create multi-component films or complex alloys.
Physical Vapor Deposition (PVD)
Thin Film Deposition System PRO Line PVD 200

The PRO Line PVD 200 system elevates research productivity with its capability to process large wafers up to 8 inches. The system serves as a perfect solution to shorten your experimental turnaround time, delivering absolutely uniform thin-film deposition for future industrial applications.

High-Resolution Ultra-Trace Analysis
X-ray Photoelectron Spectrocopy (XPS) SPECS EnviroESCA

SPECS' EnviroESCA is an electron spectroscopy system for chemical analysis in real-world environmental conditions thanks to breakthrough (N)AP-XPS technology. The device operates at pressures of up to hundreds of mbar, integrating a micro-focused AlKalpha monochromatic X-ray source and Environmental Charge Compensation to automatically neutralize background charging. EnviroESCA minimizes the time from loading to measuring samples, ideal for research on biological materials, polymers, batteries, catalysts, and liquids.

Physical Vapor Deposition (PVD)
Thin Film Deposition System PRO Line PVD 75
The new generation PRO Line PVD 75 thin film deposition system with the capability to handle samples up to 6 inches. The device optimizes ideal base pressure, increases vacuum pumping speed, and supports multiple techniques (Sputtering, E-beam, Thermal). This is a flexible, reliable R&D solution for semiconductor, OLED, and optical technology.
X-ray Absorption Spectroscopy (XAS)
X-ray Absorption Spectroscopy (XAS) QuantumLeap-H2000

QuantumLeap is an advanced X-ray Absorption Spectroscopy (XAS) system featuring dual transmission and fluorescence modes. The system offers a wide energy range from 4.5 to 25 keV and stands as the only laboratory-scale XAS that delivers synchrotron-equivalent performance directly to your lab, providing solutions for batteries and solar cells, catalysis, and heavy element research.

X-ray Absorption Spectroscopy (XAS)
X-ray absorption spectroscopy (XAS) QuantumLeap-V210

The first XAS system capable of analyzing low atomic number samples and micro-point analysis. Allows XANES measurements at 0.7 eV and EXAFS within seconds or minutes. MicroXAS with a spot size of 100 microns with an automated sample stage allows XAS mapping at a resolution of 100 µm on a sample. It is the leading solution for battery research, catalysis, and materials science.

Fundamental Research Equipment
Glove Box PureMod
The PureMod Series glove box system belongs to the high-end Modular Range of Jacomex, integrating a high-performance independent clean air recirculation unit Core-10. The device provides excellent performance for any experimental or industrial development process that requires high flexibility in modularity and an atmosphere with ultra-clean purity (< 1 ppm H₂O and O₂).
Fundamental Research Equipment
Glove Box PureSmart
The PureSmart Series glove box system belongs to the standard range of Jacomex, integrating an independent clean air circulation system, designed to optimally meet standardization needs in academic research, start-up laboratories, and high-tech industries.
Fundamental Research Equipment
Glove Box PureEvo
The PureEvo Series glove box system is a high-end, fully customizable configuration (Premium and Fully Customizable) from Jacomex, integrating a high-performance independent Core-12 clean air unit. The device is designed and optimized without limits to perfectly adapt to any complex or specific processes in advanced scientific research and high-tech industry.
Fundamental Research Equipment
Glove Box Jacomex G(Box)
The G(BOX) Series glove box system is part of the modular equipment segment for pressure and humidity control (Modular Glove Box under Regulated Atmosphere) from Jacomex, designed specifically for scientific and industrial applications. The device features a flexible structure, easy to configure and upgrade, providing optimal product protection solutions in environments with controlled humidity or reduced oxygen atmosphere to prevent explosions.
Fundamental Research Equipment
Glovebox Jacomex G(Safe)
The G(Safe) Series glove box system belongs to the high safety protective equipment segment operating in a negative pressure filtered air environment (High Security Glove Box under Negative Pressure Filtered Air) from Jacomex, designed specifically for applications in nuclear research, radiation, and critical industry. The equipment provides a solution for isolation, comprehensively protecting the operator and the environment from harmful agents, radiation, or high biological contamination risks.
High-Resolution Ultra-Trace Analysis
X-ray Photoelectron Spectrocopy (XPS) SPECS EnviroMETROS

SPECS EnviroMETROS is the next generation of XPS surface measurement systems (Surface Hybrid Metrology) that is revolutionary, designed specifically for analyzing the chemical composition in depth of thin films from laboratory scale to semiconductor manufacturing. The system integrates core technology of angle-resolved X-ray photoelectron spectroscopy (ARXPS) that is fully automated, combining flexible multi-source X-ray energy and the ability to operate in a very wide pressure range from ultra-high vacuum (UHV) to near-atmospheric pressure (NAP). This is the optimal solution for analyzing layer structure and material properties without destroying the sample.

Physical Vapor Deposition (PVD)
Physical Vapor Deposition Batch In-Line KDF

KDF In-Line PVD Solutions (part of the Kurt J. Lesker group) is a line of advanced batch in-line thin film sputtering equipment, boasting superior mechanical reliability and the lowest cost of ownership (CoO) in the industry. Unlike bulky cluster tools, the continuous lane structure of KDF optimizes space, simplifies operation and maintenance processes, while providing a leap in coating uniformity, output yield, and process stability. The system is designed flexibly, perfectly meeting the needs from research and development (R&D) scale to large-scale industrial production in the fields of semiconductors, new materials, medical devices, and flat panel displays.

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