NANOS is designed to be compact and modern, providing high-resolution imaging capabilities (< 8nm) and rapid high-quality elemental analysis with a magnification of 200,000x. NANOS becomes the ideal solution for research, industrial, and environmental applications.

Possessing atom probe tomography (APT) technology, EIKOS-UV atom probe microscope brings the ability to detect single atoms with near-atomic spatial resolution. The device provides a quantitative 3D compositional map, being the optimal cost-effective solution for metallurgical research, additive manufacturing (3D printing), and thin films with superior performance.

Jupiter XR is a large sample AFM that integrates both high-speed scanning and an extended scan range in a single probe (XR scanner). The proprietary blueDrive™ Tapping Mode technology simplifies operation, increases repeatability, and extends probe lifespan. The laser and detector system is fully controlled by software. An ideal solution for industrial measurement, material R&D, semiconductors, polymers and diverse research.

TriLambdaXRM-30 (nanoXRM) utilizes Sigray's proprietary X-ray optics technology to provide cutting-edge resolution of 35nm. The device integrates up to 3 X-ray energy sources simultaneously to optimize the 3D nanoXRM image contrast for all types of materials from polymers to metals, providing a perfect non-destructive sample solution for batteries and biology.

SPECS FE-LEEM/PEEM P90 Series is a next-generation surface electron microscope system, combining a breakthrough between LEEM and PEEM techniques in a minimalist, ultra-stable modular design. Equipped with a Cold Field Emission Gun and an integrated energy filter, the system provides micro-spectral analysis capabilities and displays thin film structure images with superior spatial resolution below 2nm. This is the optimal analytical solution for in situ surface kinetics studies in situ, advanced materials science, and nanotechnology

CIQTEK HEM6000 integrates technologies such as a high-brightness electron gun with a large beam current, a high-speed electron beam deflection system, and a high voltage sample deceleration mechanism. The device accelerates the speed of large-scale nano structure imaging up to 5 times faster than conventional FESEM, providing a perfect large-scale 3D reconstruction solution for the semiconductor and biological industries (biological 3D reconstruction).