F&S Bondtec 5350 is a Wedge-Wedge wire bonding machine for large wires 100–500 µm (Al) and 100–300 µm (Cu), supporting ribbons up to 250 µm. The machine uses a motorized Z/Y axis, Voice-Coil bonding force 0–1800 cN, automatic micrometer wire cutting, ultrasonic 58 kHz (optional 40–120 kHz), suitable for R&D, prototyping, and repair with high repeatability.

The 5600Ci wire bonder and pull/shear tester features a proprietary All-in-One design, allowing for flexible switching between automatic pull and shear test heads. The system achieves an accuracy of up to 0.1% and a rapid testing speed of 2 to 3 seconds per wire, driven by an intelligent machine vision system. The equipment optimizes investment costs, supports SPC-compliant data storage, and serves as an ideal solution for COB and hybrid microcircuit applications within the semiconductor industry.

The F&S Bondtec 5310 is a manual wire bonder specialized for processing gold (Au) wires with diameters ranging from 17.5 to 50 µm on 2-inch spools. The system achieves a fine-step resolution of 1 µm, integrates a thermal controller heating up to 250°C, and stores bonding parameters directly to the hard drive. Delivering highly uniform and reproducible bonding results, this equipment is ideal for prototyping, R&D, and microcircuit repair.

The F&S BONDTEC 5610i is a groundbreaking semi-automatic Gold Ball wire bonder fully controlled via PC, bridging the gap between manual and automatic equipment. The system delivers an ultra-high placement accuracy of ±5 µm @ 3 Sigma, an impressive speed of 2 to 3 seconds per wire, and the flexibility to swap bond heads within just 3 minutes. Featuring two versatile operating modes (Single Bond and Multi Wire), the equipment offers outstanding optimization for advanced microcircuit bonding and die repair tasks, while seamlessly converting into a pull/shear tester.

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KDF In-Line PVD Solutions (part of the Kurt J. Lesker group) is a line of advanced batch in-line thin film sputtering equipment, boasting superior mechanical reliability and the lowest cost of ownership (CoO) in the industry. Unlike bulky cluster tools, the continuous lane structure of KDF optimizes space, simplifies operation and maintenance processes, while providing a leap in coating uniformity, output yield, and process stability. The system is designed flexibly, perfectly meeting the needs from research and development (R&D) scale to large-scale industrial production in the fields of semiconductors, new materials, medical devices, and flat panel displays.

The n.unixx-series Wafer bonding device applies breakthrough Thermal-Pressure Bonding technology. The system features a sophisticated mechanical pressure generator and a heating temperature range of up to 200°C with uniformity of ±0.5°C, providing a perfect film bonding connection. The device is an ideal solution to optimize the single wafer bonding process for MEMS applications, micro-electromechanical systems, and advanced semiconductor packaging.

The n.unixx-series wafer separation system uses advanced Thermal Slide Separation technology with adjustable separation force. The system integrates independent heating plates for the wafer and carrier, reaching temperatures up to 200°C along with a protective vacuum line. The device is an ideal solution for safely handling sensitive ultra-thin wafers in 3D-IC packaging, stacked semiconductor chips, and MEMS.

The ALD-150LX is Kurt J. Lesker's leading solution for atomic layer deposition (ALD), allowing for the fabrication of uniform thin films at the atomic level. The system integrates proprietary technologies such as the Precursor Focusing Technique™ (PFT) and ultrahigh purity (UHP) processing capabilities, providing high performance and flexibility for the laboratory.