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Materials Sciences
Physical Vapor Deposition (PVD)
Thin Film Deposition System PRO Line PVD 75
The new generation PRO Line PVD 75 thin film deposition system with the capability to handle samples up to 6 inches. The device optimizes ideal base pressure, increases vacuum pumping speed, and supports multiple techniques (Sputtering, E-beam, Thermal). This is a flexible, reliable R&D solution for semiconductor, OLED, and optical technology.
Secondary Ion Mass Spectrometry (SIMS)
SIMS 7f-Auto Secondary Ion Mass Spectrometer

Equipped with dual magnetic convergence SIMS technology, the IMS 7f-Auto secondary ion mass spectrometer provides excellent depth resolution with a detection limit of ppb. This is a fully automated analytical solution that delivers high throughput for the semiconductor, optoelectronics, and materials industries, maximizing productivity with continuous operation 24/7.

X-ray Absorption Spectroscopy (XAS)
X-ray Absorption Spectroscopy (XAS) QuantumLeap-H2000

QuantumLeap is an advanced X-ray Absorption Spectroscopy (XAS) system featuring dual transmission and fluorescence modes. The system offers a wide energy range from 4.5 to 25 keV and stands as the only laboratory-scale XAS that delivers synchrotron-equivalent performance directly to your lab, providing solutions for batteries and solar cells, catalysis, and heavy element research.

Secondary Ion Mass Spectrometry (SIMS)
Secondary Ion Mass Spectrometry (SIMS) - ACTINIS

Developed from the renowned IMS 7f platform, the secondary ion mass spectrometry (SIMS) with ACTINIS casing features an advanced radiation protection system, allowing for the measurement of radioactive samples up to 2 Gy/h. The device achieves sub-micron spatial resolution, optimizing transmission and the ability to measure isotope ratios. This is a safe automation solution, ideal for optimizing the nuclear fuel cycle and waste management.

X-ray Absorption Spectroscopy (XAS)
X-ray absorption spectroscopy (XAS) QuantumLeap-V210

The first XAS system capable of analyzing low atomic number samples and micro-point analysis. Allows XANES measurements at 0.7 eV and EXAFS within seconds or minutes. MicroXAS with a spot size of 100 microns with an automated sample stage allows XAS mapping at a resolution of 100 µm on a sample. It is the leading solution for battery research, catalysis, and materials science.

3D X-ray Microscopy (XRM)
TriLambda-30 X-ray Microscope

TriLambdaXRM-30 (nanoXRM) utilizes Sigray's proprietary X-ray optics technology to provide cutting-edge resolution of 35nm. The device integrates up to 3 X-ray energy sources simultaneously to optimize the 3D nanoXRM image contrast for all types of materials from polymers to metals, providing a perfect non-destructive sample solution for batteries and biology.

Micro & Nano Imaging
FE - LEEM/PEEM P90 AC

SPECS FE-LEEM/PEEM P90 Series is a next-generation surface electron microscope system, combining a breakthrough between LEEM and PEEM techniques in a minimalist, ultra-stable modular design. Equipped with a Cold Field Emission Gun and an integrated energy filter, the system provides micro-spectral analysis capabilities and displays thin film structure images with superior spatial resolution below 2nm. This is the optimal analytical solution for in situ surface kinetics studies in situ, advanced materials science, and nanotechnology

Maskless Laser Lithography (MLA)
Tabletop Maskless Aligner µMLA - Heidelberg Instruments
µMLA is a maskless lithography machine in a benchtop format, highly flexible and customizable. It offers two recording modes: Raster Scan (high speed, excellent image quality) and Vector Scan (optimized for curves, low edge roughness). Variable resolution, supporting up to 3 wavelengths (LED/laser). A compact solution for MEMS research, microfluidics, and micro-optics.
Maskless Laser Lithography (MLA)
Maskless Laser Lithography DWL 2000 GS / DWL 4000 GS
DWL 2000 GS / 4000 GS meets industrial standards, supports CAD output with 1023 gray levels. The proprietary Grayscale technology from Heidelberg Instruments allows for the creation of 2.5D structures and micro lenses with a surface roughness down to 5nm. An optimal solution for hologram fabrication, light diffusion modules, and Fresnel lenses in optical research and micro-optics.
Cryogenic Systems
Bluefors LD Dilution Refrigerator Systems

The Bluefors LD series dilution refrigerator system provides a stable milli-Kelvin cryogenic environment for quantum computing research, supporting superconducting qubits and quantum measurements with high accuracy.  The system uses a helium-3/helium-4 mixture to achieve and maintain continuous milli-Kelvin temperatures through a dilution mechanism in the mixing chamber.

Electron Microscopy (SEM & TEM)
Scanning electron microscope - Focused Ion Beam DB550
FIB-SEM|DB550 integrated with electron optical technology SuperTunnel breakthrough with Gallium ion beam (Ga⁺ liquid metal ion source), providing a resolution of 3nm and sharp images. The device helps optimize the analysis and sample preparation process TEM specimen preparation, perfectly applicable for the semiconductor (semiconductor) field and materials science.
Probe Stations & Testing
Nanoindentation Tester ENT-5

The nano hardness measurement system provides high data reproducibility by minimizing environmental noise effects during measurement. Test load: 0.5 µN ~ 2 N. Simple operation and high data reproducibility. 


Fundamental Research Equipment
Glove Box PureMod
The PureMod Series glove box system belongs to the high-end Modular Range of Jacomex, integrating a high-performance independent clean air recirculation unit Core-10. The device provides excellent performance for any experimental or industrial development process that requires high flexibility in modularity and an atmosphere with ultra-clean purity (< 1 ppm H₂O and O₂).
Fundamental Research Equipment
Glove Box PureSmart
The PureSmart Series glove box system belongs to the standard range of Jacomex, integrating an independent clean air circulation system, designed to optimally meet standardization needs in academic research, start-up laboratories, and high-tech industries.
Fundamental Research Equipment
Glove Box PureEvo
The PureEvo Series glove box system is a high-end, fully customizable configuration (Premium and Fully Customizable) from Jacomex, integrating a high-performance independent Core-12 clean air unit. The device is designed and optimized without limits to perfectly adapt to any complex or specific processes in advanced scientific research and high-tech industry.
Fundamental Research Equipment
Glove Box Jacomex G(Box)
The G(BOX) Series glove box system is part of the modular equipment segment for pressure and humidity control (Modular Glove Box under Regulated Atmosphere) from Jacomex, designed specifically for scientific and industrial applications. The device features a flexible structure, easy to configure and upgrade, providing optimal product protection solutions in environments with controlled humidity or reduced oxygen atmosphere to prevent explosions.
Fundamental Research Equipment
Glovebox Jacomex G(Safe)
The G(Safe) Series glove box system belongs to the high safety protective equipment segment operating in a negative pressure filtered air environment (High Security Glove Box under Negative Pressure Filtered Air) from Jacomex, designed specifically for applications in nuclear research, radiation, and critical industry. The equipment provides a solution for isolation, comprehensively protecting the operator and the environment from harmful agents, radiation, or high biological contamination risks.
Electron Microscopy (SEM & TEM)
High Speed Scanning Electron Microscope HEM6000

CIQTEK HEM6000 integrates technologies such as a high-brightness electron gun with a large beam current, a high-speed electron beam deflection system, and a high voltage sample deceleration mechanism. The device accelerates the speed of large-scale nano structure imaging up to 5 times faster than conventional FESEM, providing a perfect large-scale 3D reconstruction solution for the semiconductor and biological industries (biological 3D reconstruction).

Maskless Laser Lithography (MLA)
DWL 66+ Maskless Laser Lithography
The DWL 66+ is a versatile laser lithography machine, the highest resolution in the R&D segment with the smallest size of 200 nm. It supports the creation of 2.5D (grayscale) structures on thick photoresist, with XR writing mode for maximum stability and resolution. Ideal for material research, micro-electronics, and small quantity mask lithography.
Cryogenic Systems
Bluefors XLDsl Dilution Refrigerator Measurement Systems
The XLDsl Dilution Refrigerator Measurement System is a cryogenic dilution refrigerator designed for research and quantum computing applications, providing a stable cryogenic environment at milli-Kelvin levels to operate superconducting qubits, while integrating precise measurement capabilities for experiments and the development of quantum technology.
Cryogenic Systems
Bluefors SD Dilution Refrigerator Measurement Systems
The Bluefors SD Dilution Refrigerator Measurement System provides a stable cryogenic milli-Kelvin environment for quantum computing research, supporting superconducting qubits and quantum measurements with high accuracy.
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