Main features
- Fixed optical system, automatic real-time focusing, high-end static gas table
- High-resolution interferometer continuously monitors table position
- Advanced climate control, temperature stability ±0.1°C, ISO 4 environment
- Integrated CCD camera and overall camera for easy alignment
- Supports 4 write modes to optimize performance for each application
- Creates complex structures from CAD files (DXF, BMP, STL, X,Y,Z-ASCII) up to 1023 gray levels
- Comprehensive software: manipulates and combines CAD files, creates complex patterns, optimizes structures
Detailed description
Technology & principles
DWL 2000 GS / 4000 GS – Grayscale laser lithography system, using 1023 gray levels (unlike traditional binary lithography). 3D CAD data → directly maps laser intensity → creates continuous 2.5D structures (micro lenses, blazed gratings) in just one step.
Limitations of traditional lithography
- Binary lithography requires multiple masks + multiple overlapping etching steps, prone to alignment errors.
- With micro lens lens/hologram, the old method takes weeks due to design, mask fabrication, and multiple alignments.
- The cost of chrome masks is very high, especially when many masks are needed for complex structures.
- Lack of direct conversion software 3D CAD → laser signal, causing geometric distortion.
Ưu điểm của hệ thống DWL 2000 GS / 4000 GS
- A single step grayscale process - saves costs and mask production time, faster than e-beam lithography. Smooth surface (roughness 5nm). Software imports STL/DXF/BMP, automatic mapping; supports GenISys BEAMER.
Integration/expansion
Combines profilometer, microscope; compatible with optical barriers AZ 1500, AZ 4562; easy to integrate into clean rooms.