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SIMS 7f-Auto Secondary Ion Mass Spectrometer

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SIMS 7f-Auto Secondary Ion Mass Spectrometer

Equipped with dual magnetic convergence SIMS technology, the IMS 7f-Auto secondary ion mass spectrometer provides excellent depth resolution with a detection limit of ppb. This is a fully automated analytical solution that delivers high throughput for the semiconductor, optoelectronics, and materials industries, maximizing productivity with continuous operation 24/7.

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  • Field of Study
  • Brand - Cameca
  • Sample materials
Cameca
Cameca

The world's number one manufacturer of Secondary Ion Mass Spectrometry (SIMS) and Atomic Probe Tomography (APT) equipment.

Key Features


  • Outstanding depth resolution: The low-energy collision mode ion source operation (500 eV for O2+) enables detailed analysis of shallow implant surfaces and thin film structures with optimal sensitivity.
  • High-throughput automation: The motorized storage chamber automatically changes up to 6 sample trays, combined with automated transfer operations, allowing for the establishment of unattended sequence measurement analysis.
  • 3D Ion Imaging capability: Continuously acquire elemental distribution image sequences in depth and reconstruct ultra-microscopic 3D structures through powerful WinImage software.
  • Dual O2+ and Cs+ ion source system: Provides rapid sputtering rates with both negative and positive secondary ion analysis modes.
  • Automatic charge compensation with NEG gun: The normal incidence electron gun (NEG) eliminates surface charge accumulation effects, ensuring easy and accurate measurements on all insulating materials such as glass and ceramics.
  • Grid area software (Checkerboard): Customize the analysis area to eliminate noise effects at the crater edge, helping to improve signal quality with depth in a groundbreaking way.

Detailed description


Advanced double focusing mass spectrometry technology

Inherited and developed from CAMECA's renowned system, the IMS 7f-Auto applies magnetic sector double focusing technology with ultra-fast peak switching capability. The unique ion optical structure combined with a detection system that has an extended dynamic range (10 decades) ensures the tool always maintains the highest beam stability. As a result, the device provides unmatched elemental and isotopic analytical sensitivity in the market, with detection limits ranging from ppm down to ultra-trace ppb.

Quantifying noise-free depth for complex materials

In the semiconductor industry or in the production of LED devices and photovoltaic cells, accurately determining the spatial distribution of impurities or dopants at the micro level has always been a significant barrier. The IMS 7f-Auto thoroughly addresses this bottleneck with a NEG electric compensation mechanism for the isolation membrane, and an ultra-high vacuum (UHV) environment that allows for the exclusion of analytical noise from light elements such as Hydrogen, Carbon, Nitrogen, and Oxygen. Furthermore, the integrated Checkerboard feature optimizes the deep computational surface, providing absolutely representative analytical data compared to conventional spectroscopic microscopy techniques.

Industrial-scale automated chain analysis capability

To meet the standards of massive productivity, the IMS 7f-Auto has been redesigned with a motorized sample chamber containing 6 one-inch sample holders, supporting a multi-point remote loading/unloading mechanism. Under the coordination of an advanced application suite, processes from aligning the detector, fine-tuning the image link aperture to calculating the mass chain are automatically activated sequentially. Regardless of independent overnight operation (24h/day), the system maintains excellence in dose reproducibility (Dose reproducibility achieving RSD < 0.5%), freeing technical personnel from manual intervention.

Detailed specifications


Components / Features Detailed specifications
Primary ion source system (Primary Column) • New generation in-line design optimizes beam alignment.
  • Simultaneously mounts two high-brightness ion sources: Duoplasmatron (for analyzing low electronegativity elements) and Cesium (Cs) microbeam source (for analyzing high electronegativity elements). The Cs source features an automatic sliding mechanism controlled by a computer.
  • The accel-decel extraction system allows the collision energy of primary ions to be reduced to a low 500 eV, achieving excellent depth resolution.
Mass Spectrometer • Double focusing magnetic sector mass spectrometer system.
  • The peak mass conversion speed (peak switching) is rapid.
Detection System • Combination 01 Faraday Cup and 01 Electron Multiplier .
  • Wide counting range up to 10 decades of dynamic range.
Automated Storage Chamber • The storage chamber is motorized, holding up to 6 sample trays (1 inch diameter) in a high vacuum environment.
  • The sample transfer mechanism between the storage chamber and the analysis chamber is fully automated by computer.
Ion Imaging Capabilities Microscope Mode (Direct Ion Imaging / Microscope Mode): Captures direct images with a lateral resolution of up to ~1 µm (optimal for large area mapping and fast 3D analysis) .
  Scanning Ion Imaging / Microprobe Mode: Scans a finely focused primary beam on the surface, achieving lateral resolution below the micron level (sub-micron).
Sample charge compensation capability for insulator analysis • Equipped with a normal incidence electron gun.
  • An automatic charge compensation mechanism for accurate analysis of insulating materials (glass, synthetic diamond, multilayer structures...) in negative ion mode.
Repeatability and Operational Performance • Relative standard deviation of dose (Dose reproducibility): RSD < 0.5% (achieving a level of 0.46% in actual testing with Arsenic in Silicon) between the windows of measurement and between different sample trays .
  • Continuous operation capability 24/7 without direct supervision from the operator.
Integrated software WinCurve: Processing depth profile data and mass spectrum, calibration of multi-layer scales .
  WinImage: 3D image reconstruction, RGB layer processing, ROI analysis .
  Checkerboard: Optimizing data acquisition, eliminating sputter crater edge effects (crater edge effects) .
  APM (Optional): Automatic particle scanning software that allows rapid screening and analysis of the isotopic composition of thousands of sample particles in a few hours.


Field of Study Materials Sciences or Semiconductor Technology
Sample materials Metals & Alloys or Advanced Materials
Brand Cameca
SIMS 7f-Auto Secondary Ion Mass Spectrometer
SIMS 7f-Auto Secondary Ion Mass Spectrometer
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