Key features
- Breakthrough optical technology: Utilizing a new optical design (patent applied) that accurately records the distance between the heat shield and the molten Silicon.
- Superior accuracy and measurement speed: Provides extremely low error (<0.5 mm) with a sampling rate of up to 5 Hz, meeting the requirements for continuous monitoring under extreme temperature conditions (up to 1500°C).
- Flexible measurement range: Supports a wide gap distance scanning range from 3 – 30 mm, perfectly compatible with the kinematic variations throughout the ingot pulling process.
- Visual data analysis: Integrates automatic data logging and trend data charting features to help engineers monitor quality fluctuations in real-time.
- Easy integration capability: Provides a dedicated line interface, supporting quick connections and easy synchronization into existing crystal pulling systems.
Detailed description
Gap distance control using optical technology
In the process of producing monocrystalline Silicon wafers for electronic devices or solar panels, a thermal shield is used to stabilize the thermodynamic parameters at the transition region from liquid phase to solid phase. The inline measurement device ETA-SiCAM from NXT applies advanced optical technology, continuously capturing optical images to accurately determine the distance between the lower edge of the thermal shield and the surface of the liquid Silicon block at temperatures up to 1500°C.
Solving the problem of crystal quality loss
The gap distance is not fixed but continuously changes throughout the wafer development process, directly causing fluctuations in the thermal environment. If not monitored and readjusted, the risk of producing low-quality products is very high. ETA-SiCAM completely addresses this barrier with its distance measurement capability achieving an accuracy of less than 0.5 mm. Thanks to continuous feedback parameters, the crystal pulling system can instantly readjust, ensuring that the crystallization environment remains in an ideally stable state.
Real-time trend analysis and alert platform
In addition to the compact measurement head, the system provides a graphical interface that visually displays analysis curves and instantaneous measurement indices. All data is automatically recorded by the system and transmitted via a communication standard, making it easy for the device to integrate into the factory line, establishing a consistent quality control (QA) process without destroying the sample.