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Quantum Technology
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Flip-chip Bonding
Flip-Chip Bonder SET ACCµRA100

The ACCµRA100 uses semi-automatic robotic axis technology, achieving superior post-weld accuracy of ± 0.5 µm and a large pressing force of 1-1000 N. The device provides high repeatability, optimal cost, and is an ideal solution for research (R&D) and diverse applications such as Flip-Chip, Die attach, MEMS, 3D Packaging.

Synthesis & Fabrication
Ion Beam Etching/Sputtering System Elionix 200ERP

EIS-200ERP (Elionix Ion Beam Etching/Sputtering System): This is an ion beam etching/sputtering system capable of nano-level material etching and deposition utilizing an ECR (Electron Cyclotron Resonance) ion beam.

 

Chemical Vapor Deposition (CVD)
Plasma Enhanced Chemical Vapour Deposition Model PlasmaPro 80/100/800

The PlasmaPro series from Oxford Instruments provides flexible plasma processing platforms from R&D to high-volume production, including RIE, ICP, ICP CVD, PECVD, and combined RIE/PE technologies. It supports wafers from small pieces to 300mm, controls film stress with dual frequency (LF/HF), and detects endpoint using OES/laser. An optimal solution for MEMS, sensors, optics, LEDs, power microelectronics, and failure analysis.

Synthesis & Fabrication
Electron Beam Lithography System ELS-ORCA
ELS-ORCA the application of advanced 30kV EBL Column technology with an upgrade option to 50kV exclusive. The system features an outstanding writing speed of 100 MHz and a Minimum Line Width resolution of up to 10 nm. This is the ideal solution for nano fabrication applications and advanced semiconductor material research and development (R&D).
Accelerator Mass Spectrometry (AMS)
Mini Carbon Dating System ¹⁴C (MICADAS)

MICADAS is the leading AMS ¹⁴C system from Ionplus AG, providing superior accuracy, energy efficiency, and a compact design for advanced radiocarbon dating applications.

3D X-ray Microscopy (XRM)
XRF Microscope AttoMap-310

The AttoMap-310 provides trace element mapping capabilities with an exceptional sensitivity that is 1000 times higher than SEM-EDS. Sigray's proprietary X-ray source technology enables a spatial resolution down to <3-5µm and speeds up to 5ms/point, delivering a breakthrough solution for semiconductor research, mineralogy, and materials science.

High-Resolution Ultra-Trace Analysis
X-ray Photoelectron Spectrometry (XPS) SPECS ProvenX

Danh mục sản phẩm của SPECS đã được mở rộng với dòng hệ thống quang phổ XPS ProvenX, đại diện cho đỉnh cao từ nền tảng kiến thức rộng lớn của chúng tôi trong việc phát triển và sản xuất các hệ thống phân tích toàn diện nhằm đáp ứng những yêu cầu khoa học khắt khe nhất. ProvenX bao gồm một loạt các hệ thống XPS chuyên dụng cho ARPES, µ-ARPES, Kính hiển vi động lượng (Momentum Microscopy), XPS/UPS cũng như NAP-XPS.

X-ray Diffraction (XRD)
Horizontal electron diffractometer ELDICO ED-1

As the world's first dedicated horizontal electron diffraction machine, the ELDICO ED-1 combines a 160 keV beam source and a DECTRIS QUADRO detector. The device achieves a resolution of <0.84 Å, enabling rapid decoding of nano crystal structures (10–1000 nm). This is the optimal cost-effective solution for pharmaceutical research, battery materials, and agricultural chemicals.

High-Resolution Ultra-Trace Analysis
X-ray Photoelectron Spectrocopy (XPS) SPECS EnviroESCA

SPECS' EnviroESCA is an electron spectroscopy system for chemical analysis in real-world environmental conditions thanks to breakthrough (N)AP-XPS technology. The device operates at pressures of up to hundreds of mbar, integrating a micro-focused AlKalpha monochromatic X-ray source and Environmental Charge Compensation to automatically neutralize background charging. EnviroESCA minimizes the time from loading to measuring samples, ideal for research on biological materials, polymers, batteries, catalysts, and liquids.

Micro & Nano Imaging
FE - LEEM/PEEM P90 AC

SPECS FE-LEEM/PEEM P90 Series is a next-generation surface electron microscope system, combining a breakthrough between LEEM and PEEM techniques in a minimalist, ultra-stable modular design. Equipped with a Cold Field Emission Gun and an integrated energy filter, the system provides micro-spectral analysis capabilities and displays thin film structure images with superior spatial resolution below 2nm. This is the optimal analytical solution for in situ surface kinetics studies in situ, advanced materials science, and nanotechnology

3D X-ray Microscopy (XRM)
X-ray Microscope (XRM) 3D Apex XCT-150

The Apex XCT-150 is an X-ray microscope that delivers incredible results by providing sub-micron resolution 3D imaging in just minutes. It is an advanced tool for failure analysis and packaging in the semiconductor industry. The system features a spatial resolution of 0.5 microns anywhere on samples up to 300 mm in diameter. With the Apex XCT, failure analysis workflows can be streamlined by imaging entire intact packages, wafers, and PCBs, minimizing time-consuming and destructive sample preparation.

Cryogenic Systems
Bluefors XLDsl Dilution Refrigerator Measurement Systems
The XLDsl Dilution Refrigerator Measurement System is a cryogenic dilution refrigerator designed for research and quantum computing applications, providing a stable cryogenic environment at milli-Kelvin levels to operate superconducting qubits, while integrating precise measurement capabilities for experiments and the development of quantum technology.
Cryogenic Systems
Bluefors Ultra-Compact LD Dilution Refrigerator Measurement Systems
The Ultra-Compact LD helium dilution refrigerator system from Bluefors is a high-end integrated cryogenic solution, allowing for temperatures down to milli-Kelvin in a super compact design. The device combines a cryostat, measurement system, and control infrastructure in a synchronized platform, optimized for low-temperature physics research, quantum computing, and experiments requiring extremely high stability in confined spaces.
Cryogenic Systems
Bluefors LH Dilution Refrigerator Measurement Systems
Bluefors LH is a horizontal dilution refrigerator system, providing a stable milli-Kelvin temperature environment for cryogenic measurement applications and quantum research. The design supports operation at various angles, suitable for cryogenic detectors, beamlines, quantum optics, and ultra-low temperature experiments requiring high stability.
Cryogenic Systems
Bluefors XLDHe 1K High Power Measurement System
Bluefors XLDHehp is a high cooling power 1K cryogenic system, providing a stable low temperature environment for quantum applications and high-performance cryogenic measurements. The system supports large heat loads, high-density wiring, and low noise RF/DC measurements, suitable for spin qubits, cryogenic detectors, and ultra-low temperature research.
Cryogenic Systems
Bluefors XLDHesl 1K Measurement Systems
Bluefors XLDHesl is an integrated 1K side-loading cryogenic system that provides a stable low-temperature environment for quantum applications and high-performance cryogenic research. The side-loading design supports high-density wiring, flexible expansion, and quick replacement of measurement infrastructure for complex quantum experiments.
Cryogenic Systems
Bluefors LDHe 1K Measurement System
The 1K cryogenic measurement system using helium is designed for ultra-low temperature experiments in superconducting material research, quantum physics, and quantum devices. An optimal solution for modern R&D laboratories.
Cryogenic Systems
Bluefors SDHe 1K Measurement System
The 1K cryogenic measurement system using helium (SDHe), compact design for low temperature experiments in superconducting material research, quantum physics, and quantum technology. A flexible solution for modern R&D laboratories.
Cryogenic Systems
Bluefors Cryogenic Wafer Prober
Cryogenic wafer testing system for quantum chips, allowing characterization of quantum devices and superconducting circuits at ultra-low temperatures, supporting research and development of quantum computing technology in a wafer-level environment.
Maskless and Direct-Write Lithography
MLA 300 Maskless Aligner - Heidelberg Instruments
The MLA 300 is optimized for high volume production. The Spatial Light Modulator (SLM) technology allows for distortion correction for each die, automatically focusing on curved surfaces, compatible with SECS/GEM. Completely eliminates the costs and hassles of physical masks. Applications in MEMS production, sensors, ASIC, advanced packaging, power electronics.

Maskless and Direct-Write Lithography
ULTRA Semiconductor Mask Writer - Heidelberg Instruments
ULTRA is a lithography machine using two high-speed SLMs. Layer accuracy of 30 nm, CD uniformity of 30 mm, minimum size of 500 nm. DPSS 355 nm laser reduces operating costs by 80%. Producing masks for semiconductors, easily integrated into the mask production workshop.

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