Key features
58-liter 304L stainless steel vacuum chamber: Creates an ultra-clean, durable thin film deposition environment and optimizes vacuum pressure performance.
6061 aluminum pendulum door mechanism: Maximizes the opening area of the sample chamber and facilitates quick and safe sample loading/unloading.
Flexible multi-source deposition integration: Allows for flexible combinations of Magnetron Torus® sputtering, thermal evaporation, and organic LTE sources.
Standard 260 l/s turbo pump system: Supports extremely fast gas evacuation rates to quickly achieve ideal base pressure levels.
PC-Based HMI control system: Automates the entire operational process visually through a touchscreen and supports accurate data logging.
Detailed description
NANO 36 operates on the principle of physical vapor deposition (PVD). The device features a 58-liter vacuum chamber made of 304L stainless steel, combined with a Turbo micro pump with a speed of 260 l/s to maintain a clean base pressure environment. The system integrates flexible sources of Magnetron Torus® sputtering, thermal evaporation, or LTE to deposit thin films of metal, dielectric, or organic materials onto the substrate surface.
Laboratories often lack space for large industrial PVD systems, but conventional small-sized equipment typically does not meet the precision required for coatings. NANO 36 addresses this issue with a compact tabletop structure while maintaining high specifications: the ability to heat substrates up to 800°C and a PC-Based HMI automatic control system. This setup eliminates errors due to manual operation, ensuring uniformity and high repeatability accuracy.
The system allows direct connection to the glovebox to protect samples sensitive to air and humidity. The flexible modular design supports simultaneous configuration of up to 3 Torus® sputtering sources, additionally integrating a quartz crystal microbalance (QCM) thickness sensor and a mass flow controller (MFC) for gas supply to serve in-depth research on semiconductors or solar cells.