Main features
- Investment cost optimization (Cost-effective): The platform of encapsulation technology provides superior configuration at a reasonable cost for laboratories.
- Customization of equipment on demand (Tailored System): Flexible customization capability from 30kV to 50kV along with upgrade modules helps meet the specific research goals of experts accurately.
- Enhancing process productivity (Productive Workflow): The dedicated management software elms integrates a smart modular structure that simplifies operations, provides quick access to features, and reduces working time.
- Security and visual access control (Safeguarded Experience): The Account Management module supports clear and secure access level distribution for various user groups from basic to advanced.
- High-resolution sample observation, reduced damage (Low-damage SEM): The Beam Retarding option allows for high-resolution SEM imaging at low equivalent voltage, helping to protect the sensitive surface structure of the sample.
- Accurate, quick calibration (Precise Calibration): The automatic observation feature (Automatic SEM observation) based on CAD coordinates of exposure data helps align the photolithography samples precisely to the layout design.
Detailed description
- Technology / Principle: ELS-ORCA operates based on core technology 30kV EBL Column Design distilled from over 4 decades of experience from Elionix, using the modern ZrO/W Thermal Field Emitter. The system integrates a new generation control software elms (Elionix Lithography Management System) on the Win11 platform, handling everything from CAD data conversion, beam adjustment, exposure to SEM observation.
- In R&D, the biggest barrier for scientists is the investment cost of high-end nano lithography systems which is extremely expensive, while lower-end machines lack flexibility and can easily damage the sample during inspection. ELS-ORCA thoroughly addresses this issue by providing an entry model configuration with optimal cost but allows for strong customization. Notably, the Beam Retarding option effectively handles the low-damage surface sample bottleneck by lowering the acceleration voltage equivalent to that of dedicated SEM systems, allowing observation of areas up to 6 inches on an 8 inch wafer.
- Integration / Expansion: The ELS-ORCA platform is designed for unlimited expansion according to budget. Users can upgrade the acceleration voltage up to 50kV, integrate a dynamic focusing/stigma system, add a height sensor assist focus adjustment, or apply deep customization tools through the built-in Python Scripting feature.