EIS-200ERP (Elionix Ion Beam Etching/Sputtering System): This is an ion beam etching/sputtering system capable of nano-level material etching and deposition utilizing an ECR (Electron Cyclotron Resonance) ion beam.

The ELS-BODEN Series is optimized for ultra-fine patterning applications. The device features a writing area of up to 300 mm², flexible from small size samples, 9-inch masks to 300 mm wafers. The operation process is seamlessly automated thanks to the automatic sample loading system. The device provides a flexible range of optional acceleration voltages: 50, 100, 125, and 150 kV.