Main features
- Elionix ELS-ORCA is an advanced electron beam lithography (EBL) system designed for research and development (R&D) in the field of nanofabrication.
- This system is optimized for applications requiring high resolution and flexible customization, suitable for research laboratories and pilot production.
Detailed description
High optional features Diverse options, customizable specifications
- User-friendly software The machine control software (ELMS) is pre-installed on the ELS-ORCA system. ELMS is a comprehensive toolkit that includes modules such as CAD data conversion, beam adjustment, lithography execution, and SEM observation. This modular system makes essential functions more accessible and your workflow more efficient. The account management function of ELMS can restrict access to functions depending on the user.
- The ELS-ORCA 30 kV electron beam lithography system can be customized with various options such as a 50 kV acceleration voltage, dynamic/stigma focusing, and focus adjustment supported by height sensors. With this combination of options, the ELS-ORCA becomes a system tailored to the specific requirements of researchers.
- Deceleration options for SEM imaging The deceleration option of ELS-ORCA allows for high-resolution SEM observation with low damage levels. With a low acceleration voltage equivalent to SEM systems, ELS-ORCA enables observation areas up to 6 inches on 8-inch wafers. Automatic SEM observation using CAD data prepared for the lithography process is also supported.