EIS-200ERP (Elionix Ion Beam Etching/Sputtering System): This is an ion beam etching/sputtering system capable of nano-level material etching and deposition utilizing an ECR (Electron Cyclotron Resonance) ion beam.

The PlasmaPro series from Oxford Instruments provides flexible plasma processing platforms from R&D to high-volume production, including RIE, ICP, ICP CVD, PECVD, and combined RIE/PE technologies. It supports wafers from small pieces to 300mm, controls film stress with dual frequency (LF/HF), and detects endpoint using OES/laser. An optimal solution for MEMS, sensors, optics, LEDs, power microelectronics, and failure analysis.

NANOS is designed to be compact and modern, providing high-resolution imaging capabilities (< 8nm) and rapid high-quality elemental analysis with a magnification of 200,000x. NANOS becomes the ideal solution for research, industrial, and environmental applications.

Jupiter XR is a large sample AFM that integrates both high-speed scanning and an extended scan range in a single probe (XR scanner). The proprietary blueDrive™ Tapping Mode technology simplifies operation, increases repeatability, and extends probe lifespan. The laser and detector system is fully controlled by software. An ideal solution for industrial measurement, material R&D, semiconductors, polymers and diverse research.

The PRO Line PVD 200 system elevates research productivity with its capability to process large wafers up to 8 inches. The system serves as a perfect solution to shorten your experimental turnaround time, delivering absolutely uniform thin-film deposition for future industrial applications.

Equipped with dual magnetic convergence SIMS technology, the IMS 7f-Auto secondary ion mass spectrometer provides excellent depth resolution with a detection limit of ppb. This is a fully automated analytical solution that delivers high throughput for the semiconductor, optoelectronics, and materials industries, maximizing productivity with continuous operation 24/7.

QuantumLeap is an advanced X-ray Absorption Spectroscopy (XAS) system featuring dual transmission and fluorescence modes. The system offers a wide energy range from 4.5 to 25 keV and stands as the only laboratory-scale XAS that delivers synchrotron-equivalent performance directly to your lab, providing solutions for batteries and solar cells, catalysis, and heavy element research.

Developed from the renowned IMS 7f platform, the secondary ion mass spectrometry (SIMS) with ACTINIS casing features an advanced radiation protection system, allowing for the measurement of radioactive samples up to 2 Gy/h. The device achieves sub-micron spatial resolution, optimizing transmission and the ability to measure isotope ratios. This is a safe automation solution, ideal for optimizing the nuclear fuel cycle and waste management.

The first XAS system capable of analyzing low atomic number samples and micro-point analysis. Allows XANES measurements at 0.7 eV and EXAFS within seconds or minutes. MicroXAS with a spot size of 100 microns with an automated sample stage allows XAS mapping at a resolution of 100 µm on a sample. It is the leading solution for battery research, catalysis, and materials science.

TriLambdaXRM-30 (nanoXRM) utilizes Sigray's proprietary X-ray optics technology to provide cutting-edge resolution of 35nm. The device integrates up to 3 X-ray energy sources simultaneously to optimize the 3D nanoXRM image contrast for all types of materials from polymers to metals, providing a perfect non-destructive sample solution for batteries and biology.

KDF In-Line PVD Solutions (part of the Kurt J. Lesker group) is a line of advanced batch in-line thin film sputtering equipment, boasting superior mechanical reliability and the lowest cost of ownership (CoO) in the industry. Unlike bulky cluster tools, the continuous lane structure of KDF optimizes space, simplifies operation and maintenance processes, while providing a leap in coating uniformity, output yield, and process stability. The system is designed flexibly, perfectly meeting the needs from research and development (R&D) scale to large-scale industrial production in the fields of semiconductors, new materials, medical devices, and flat panel displays.

The ALD-150LX is Kurt J. Lesker's leading solution for atomic layer deposition (ALD), allowing for the fabrication of uniform thin films at the atomic level. The system integrates proprietary technologies such as the Precursor Focusing Technique™ (PFT) and ultrahigh purity (UHP) processing capabilities, providing high performance and flexibility for the laboratory.