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Atomic Layer Deposition TSF200 beneq-tfs200_1.webp
Atomic Layer Deposition (ALD)
Atomic Layer Deposition TSF200
The Beneq TFS 200 is the most popular atomic layer deposition (ALD) device in academic research and corporate R&D. With its diverse configuration and flexible upgrade capabilities, the system meets all specialized needs of the laboratory. The device supports many advanced applications from protective barrier films, semiconductors, solar cells to superconducting components.
Versatile ALD platform Beneq Transform® Beneq_Transform_Closeup-cleaned.webp
Atomic Layer Deposition (ALD)
Versatile ALD platform Beneq Transform®

Beneq Transform® is a high-end industrial standard ALD system for mass production in the "More-than-Moore" era. The machine integrates both Thermal ALD and PEALD, flexibly processing semiconductor wafers from 3" to 8" (with a roadmap up to 12"). This is the core thin film solution for Power Electronics (GaN, SiC), RF, MEMS, sensors, MicroLED, and Photonics.

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